Optical profilometer (38)

Wroclaw University of Science and Technology

  • material studies,
  • metrology
  • microscopy
  • profilometry

Contact person :

The optical profilometer bench is used for advanced measurements of topographic parameters of surfaces subjected to various types of treatment in a wide range of measurement scales. Thanks to the high imaging resolution and digital processing of the stand, it is possible to create images of surfaces with depths inaccessible to classical optical microscopy with sub-micrometer resolutions, enabling the measurement of shapes, surface roughness. Complementing the stand is an atomic force microscope that allows measurement of surface profiles with sub-nanometer resolution.

Elements included in the station:

  • Olympus LEXT5000 profilometer with a magnification range of 54x-17280x, field of view of 16 µm- 5120 µm, resolution of a single measurement of 4096×4096 points, resolution of displayed width and height of 1 nm.
  • CoreAFM atomic force microscope with scanning range of 100 µm, maximum height range of 12 um, and sensor noise of 250 pm.

Pricing (netto):

Associated files:

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