Contact person :
Lithography, Laser Interference Lithography and modification of the surface of materials by means of laser ablation. The system supported by a vacuum sputtering machine will enable the production of metallic and dielectric nanostructures for applications in photonics, biosensors, photovoltaics and other fields that use the interaction of light with matter.
In addition, the station contains a set of tools for preparing samples for optical recording, enabling:
- 1. physical cleaning and activation of the surface and etching of samples with a plasma cleaner using two process gases oxygen and argon,
- 2. thermal treatment at a temperature of up to 1100ºC in a protective atmosphere using a muffle furnace
- 3. chemical treatment of samples under controlled conditions of laminar air flow in a laminar chamber.
Elements included in the station:
- Femtosecond laser with a variable repetition rate equipped with a computer and a tunable optical parametric amplifier (optical oscillator) for the range of 220nm-16,000nm (LightConversion – Pharos, Orpheus) • Laser diode 405nm, 300mW (Omicron – LuxX+® 405-300)
- Plasma cleaner with RIE electrode (Diener Zepto)
- Muffle furnace with protective gas control system (Nabertherm LT 3/12)
- Laminar flow cabinet (Alpina Bio 160 B2)
Pricing (netto):
- surface cleaning with the plasma cleaner – 50 zł
- heating in the muffle furnace – 50 zł
0000-0002-9012-6437
